81.15.-z Methods of deposition of films and coatings; film growth and epitaxy (for structure of thin films, see 68.55.-a; see also 85.40.Sz ( 1 Dok. )

• 81.15.Aa Theory and models of film growth ( 1 Dok. )
• 81.15.Cd Deposition by sputtering ( 0 Dok. )
• 81.15.Ef Vacuum deposition ( 0 Dok. )
• 81.15.Fg Laser deposition ( 0 Dok. )
• 81.15.Gh Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.) (for chemistry of MOCVD, see 82.33.Ya in physical chemistry and chemical physics) ( 2 Dok. )
• 81.15.Hi Molecular, atomic, ion, and chemical beam epitaxy ( 0 Dok. )
• 81.15.Jj Ion and electron beam-assisted deposition; ion plating (see also 52.77.Dq ( 1 Dok. )
• 81.15.Kk Vapor phase epitaxy; growth from vapor phase ( 0 Dok. )
• 81.15.Lm Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids) ( 0 Dok. )
• 81.15.Np Solid phase epitaxy; growth from solid phases ( 0 Dok. )
• 81.15.Pq Electrodeposition, electroplating ( 0 Dok. )
• 81.15.Rs Spray coating techniques ( 0 Dok. )

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Letzte Änderung: 14.07.10